Physics graduate student Luke Long has been announced as the 2020 recipient of the Nick Cobb Memorial Scholarship by SPIE, the international society for optics and photonics, and Mentor Graphics, a Siemens Business, for his potential contributions to the field related to advanced lithography. Long will receive his award certificate during the Welcome and Plenary Presentations at the SPIE Advanced Lithography Symposium on Monday, February 24, in San Jose, California.
The Nick Cobb scholarship recognizes an exemplary graduate student working in the field of lithography for semiconductor manufacturing. The award honors the memory of Nick Cobb, who was an SPIE Senior Member and chief engineer at Mentor. His groundbreaking contributions enabled optical and process proximity correction for IC manufacturing.
Long is pursuing his Ph.D. degree in the physics department of the University of California at Berkeley, working with Professors Andrew Neureuther, Senior Scientist Patrick Naulleau, and Associate Professor of Chemistry and Physics Associate Professor Naomi Ginsberg. His current research interests lie in the fundamental physics of EUV photoresist, specifically in understanding the spatial propagation of chemistry responsible for the production of lithographic patterns. He received his Bachelor of Science in Engineering Physics from the University of Colorado at Boulder in 2015.