Equipment

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Equipment

Our lab has extensive capabilities for growth and characterization of new materials. For growth systems, we specialize in thin film growth. We have a UHV e-beam evaporator capable of epitaxy at a pressure of 10-10 Torr, a state-of-the-art sputtering system similar those used in industry, a thermal evaporator, and an evaporator with in-situ resistivity capabilities.

Hellman Group Equipment

For characterizing our films, we have several systems capable of magnetic and magneto-transport measurements. A Quantum Design MPMS Squid magnetometer and a LakeShore VSM measure magnetization, including vector magnetization. Several He-4 probes and a He-3 probe, along with both bore and split-coil superconducting magnets allow us to measure magnetoresistance and Hall effect in multiple geometries at a range of temperatures. In addition, our novel specific heat measurement capability can be used with these magnets to study the effect of magnetic field on the specific heat.

We also take advantage of the many great resources available to us here at Berkeley and through our collaborators. We have access to x-ray diffraction (XRD), scanning electron microscopy (SEM), transmission electron microscopy (TEM), Rutherford back-scattering (RBS), Raman spectroscopy, infrared spectroscopy, and x-ray absorption spectroscopy (XAS). These measurements allow us to better understand the new materials we are studying.

Growth

UHV e-beam evaporator

UHV e-beam evaporator

Thermal evaporator

Thermal Evaporator

Evaporator with in-situ resistivity capabilities

Evaporator with in-situ resistivity capabilities

Sputtering system

Sputtering system

Measurements

Quantum Design MPMS Squid magnetometer

Quantum Design MPMS Squid magnetometer

He-4 probe

He-4 probe

Specific heat measurement capability

Specific heat measurement capability

Heat Capacity Device

Heat Capacity Device

LakeShore VSM

LakeShore VSM

He-3 probe

He-3 probe

Heat Capacity Device

Heat Capacity Device

Deposition chamber capable of in situ resistivity measurements

Deposition chamber capable of in situ resistivity measurements